Controlled Hydrolysis of Hazardous Silicon Polymer Residue
AssigneeMitsubishi Polycrystalline Silicon America Corporation (MIPSA)
InventorsWes Teichmiller, Bryan H. Nettles, Mark Servos, Matthias A. Colomb
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Abstract
A polymer handling method for a polycrystalline silicon manufacturing device, wherein the polymer byproducts are treated in a manner that the silicon polymers are hydrolyzed. The method creates a heated treatment gas with a moisture content that both treats the polymer to a depth of about 0.25 mm to prohibit formation of the friction and shock sensitive layer near the polymer surface and keeps the hydrolyzed polymer humidified. Furthermore the polymer handling method includes inactivation of the polymer, removal of the polymer of the system and disposal of the polymer after removal.
Claims20
A polymer handling method, comprising:
- providing a sealable vessel containing silicon polymers which are a byproduct of a production of polycrystalline silicon in a Siemens process or a byproduct from a silicon epitaxy reactor;
- sealing the vessel to close the vessel to prevent gas or fluid leaking from the vessel;
- filling the vessel with an atmosphere having an oxygen concentration less than 3%;
- filling the vessel with a hydrolyzing gas having a range of about 90 to 120 grains of moisture over a temperature range of about 50 to 70° C.;
- whereby the silicon polymers are thoroughly, in whole or in part, humidified.
A polymer handling method for a polycrystalline silicon manufacturing device, comprising:
- providing the polycrystalline silicon manufacturing device containing silicon polymers which are a byproduct of a production of polycrystalline silicon in a Siemens process or a byproduct from a silicon epitaxy reactor;
- sealing the polycrystalline silicon manufacturing device to close the polycrystalline silicon manufacturing device to prevent gas or fluid leaking from the polycrystalline silicon manufacturing device;
- filling the polycrystalline silicon manufacturing device with an atmosphere having an oxygen concentration less than 3%;
- filling the polycrystalline silicon manufacturing device with a hydrolyzing gas having a range of about 90 to 120 grains of moisture over a temperature range of about 50 to 70° C.;
- whereby the silicon polymers are thoroughly, in whole or in part, humidified.
Dependencies are inferred from the claim text.