Semiconductor die and method of manufacturing the same
AssigneeInfineon Technologies Austria AG
InventorsStanislav Vitanov, Jyotshna Bhandari, Georg Ehrentraut, Christian Ranacher
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AssigneeInfineon Technologies Austria AG
InventorsStanislav Vitanov, Jyotshna Bhandari, Georg Ehrentraut, Christian Ranacher
Estimating the term…
This application relates to semiconductor die including: a transistor device formed in an active area of a semiconductor body and having a channel region, a gate region, and a field electrode region, the gate region arranged laterally aside the channel region and having a gate electrode for controlling a current flow in the channel region, the gate electrode formed in a gate trench extending into the semiconductor body; and an additional device formed in an additional device area of the semiconductor body. A recess extends into the semiconductor body in the additional device area, and a semiconductor material is arranged in the recess in which the additional device is formed.
A semiconductor die, comprising:
A method of manufacturing a semiconductor die including a transistor device formed in an active area of a semiconductor body and having a channel region, a gate region, and a field electrode region, the gate region arranged laterally aside the channel region and having a gate electrode for controlling a current flow in the channel region;
Dependencies are inferred from the claim text.