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US 2022/0102351 A1Published application
Apparatuses including elongate pillars of access devices
AssigneeMicron Technology, Inc.
InventorsSong Guo, Sanh D. Tang, Shen Hu, Yan Li, Nicholas R. Tapias
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Abstract
A method of forming an apparatus comprises forming pillar structures extending from a base material. Upper portions of the pillar structures may exhibit a lateral width that is relatively greater than a lateral width of lower portions of the pillar structures. The method also comprises forming access lines laterally adjacent to the lower portions of the pillar structures and forming digit lines above upper surfaces of the pillar structures. Memory devices and electronic systems are also described.
Claims20
An apparatus, comprising:
- storage node structures;
- and
- elongate pillars of access devices operably coupled to the storage node structures, individual elongate pillars comprising storage node contact regions and a digit line contact region laterally between the storage node contact regions, upper portions of the elongate pillars comprising a cross-sectional area that is relatively greater than a cross-sectional area of lower portions thereof.
An apparatus, comprising:
- access devices comprising elongate pillars, upper portions of the elongate pillars exhibiting a relatively greater lateral dimension than a lateral dimension of lower portions thereof, the elongate pillars comprising contact regions laterally separating opposing contact pads;
- and
- access lines operably coupled to the access devices, wherein the access lines are laterally adjacent to the lower portions of the elongate pillars without being laterally adjacent to the upper portions thereof.
An apparatus, comprising:
- at least one memory device comprising:
- memory cells comprising storage node structures and access devices operably coupled to the storage node structures;
- elongate pillars operably coupled to the storage node structures, the elongate pillars comprising a digit line contact region and storage node contact regions laterally flanking the digit line contact region;
- and
- an isolation material substantially surrounding the elongate pillars, wherein upper portions of the elongate pillars exhibit a greater critical dimension in at least one horizontal direction relative to lower portions thereof.
2 more elements
Dependencies are inferred from the claim text.