High performance integrated rf passives using dual lithography process
AssigneeIntel Corporation
InventorsAdel A. ELSHERBINI, Mathew J. MANUSHAROW, Krishna BHARATH, William J. LAMBERT, Robert L. SANKMAN, Aleksandar ALEKSOV, Brandon M. RAWLINGS, Feras EID, Javier SOTO GONZALEZ, Meizi JIAO, Suddhasattwa NAD, Telesphor KAMGAING
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