Reticle pod with antistatic capability
AssigneeGudeng Precision Industrial Co., Ltd.
InventorsMing-Chien Chiu, Chia-Ho Chuang, Yi-Hsuan Lee, Hsing-Min Wen, Hsin-Min Hsueh
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Abstract
A reticle pod with antistatic capability includes a base and plural of support members. The base has a carrying surface having a recess formed thereon and defined by a bottom surface. The support members encircle the carrying surface of the base and are adapted to support a reticle. The recess is defined by a depth extending between the carrying surface and the bottom surface. The depth ranges from 300 μm to 3400 μm to thereby weaken the electrostatic force exerted upon particles on the carrying surface.
Claims17
A reticle pod with antistatic capability, comprising:
- a base having a carrying surface, the carrying surface having a recess defined by a bottom surface;
- and
- a plurality of support members encircling the carrying surface of the base and configured to support a reticle,
- wherein the recess is defined by a depth extending between the carrying surface and the bottom surface, the depth ranging from 300 μm to 3400 μm, so as to weaken electrostatic force exerted upon particles on the carrying surface.
(canceled)
A reticle pod with antistatic capability, comprising:
- a base having an upper surface, the upper surface being a deflected surface formed by mechanical processing;
- and
- a plurality of support members encircling the upper surface and configured to support a reticle, wherein formed between a downward-facing surface of the reticle and the upper surface of the base is a gap at least greater than 300 μm to weaken electrostatic force exerted upon particles on the upper surface of the base.
(canceled)
A method of processing a reticle pod, applied to a base of a reticle pod, the base having a carrying surface and a plurality of support members, the plurality of support members encircling the carrying surface of the base and configured to support a reticle, the method comprising the steps of:
- processing mechanically the carrying surface to form thereon a recess, the recess being defined by a bottom surface;
- and
- processing the recess to define the recess by a depth according to a residual voltage of the reticle, the depth being at least greater than 300 μm.
Dependencies are inferred from the claim text.