Method for improving etching rate of wet etching
AssigneeChangxin Memory Technologies, Inc.
InventorsNannan ZHANG, YEN-TENG HUANG
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Abstract
A method for improving an etching rate of wet etching involves an etching reaction chamber used for etching work. The etching reaction chamber is connected with an etchant supply mechanism. The etchant supply mechanism is connected with a purified water supply mechanism. The purified water supply mechanism injects purified water into the etchant supply mechanism according to a change range of pH of the etchant in the etchant supply mechanism to ensure that a hydrogen ion concentration and a fluoride ion concentration of the etchant in the etchant supply mechanism are stable.
Claims16
A method for improving an etching rate of wet etching used in an etching reaction chamber for etching work, the etching reaction chamber being connected with an etchant supply mechanism, the etchant supply mechanism being connected with a purified water supply mechanism, comprising:
- injecting the purified water into the etchant supply mechanism by the purified water supply mechanism according to a change range of pH of a etchant in the etchant supply mechanism to ensure that a hydrogen ion concentration and a fluoride ion concentration of the etchant in the etchant supply mechanism are stable.
Dependencies are inferred from the claim text.