Method for forming an ultraviolet radiation responsive metal oxide-containing film

A method for forming and irradiating an ultraviolet (UV) radiation responsive metal containing film, the method comprising:

• depositing an UV radiation responsive metal containing film over a substrate, the UV radiation responsive metal containing film having a substantially uniform etch rate, wherein depositing comprises:
• heating the substrate to a deposition temperature of less than 200° C.;
• contacting the substrate with a first vapor phase reactant comprising a metal component, a hydrogen component, and a carbon component;
• and
• contacting the substrate with a second vapor phase reactant comprising at least one of an oxygen containing precursor or organic precursor;
• and
• irradiating select portions of the UV radiation responsive metal containing film with UV radiation thereby forming a metal containing film with irradiated portions having a first etch rate and non-irradiated portions having a second etch rate different from the first etch rate.