Quantification of Processing Chamber Species by Electron Energy Sweep
AssigneeTokyo Electron Limited
InventorsJianping Zhao, Peter Ventzek, Charles Schlechte, Michael Hummel
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AssigneeTokyo Electron Limited
InventorsJianping Zhao, Peter Ventzek, Charles Schlechte, Michael Hummel
Estimating the term…
A plasma processing system includes a plasma chamber configured to contain a plasma, a shutter chamber fluidically coupled to the plasma chamber via a first orifice, a mass spectrometer fluidically coupled to the shutter chamber, and a shutter disposed in the shutter chamber between the first orifice and the mass spectrometer in the path of a particle beam. The first orifice is configured to generate the particle beam from the plasma using a pressure differential between the shutter chamber and the plasma chamber. The mass spectrometer includes an ionizer configured to ionize species of the particle beam by sweeping through a range of electron energies in a plurality of energy steps. The shutter is configured to open and close during each of the plurality of energy steps.
A plasma processing system comprising:
A method of measuring quantities of species in a processing chamber, the method comprising:
A method of measuring quantities of a species present in a processing chamber, the method comprising:
Dependencies are inferred from the claim text.