US 2022/0102108 A1Published application

Charged particle beam apparatus

AssigneeHitachi High-Tech Corporation

InventorsTakafumi Miwa, Yohei Nakamura, Natsuki Tsuno, Heita Kimizuka, Muneyuki Fukuda

Life of this patent

Estimating the term…

Loading patent…

Abstract

A computing unit generates a to-be-used-in-computation netlist on the basis of a to-be-used-in-calculation device model corresponding to a correction sample, estimates a first application result, on the basis of the to-be-used-in-computation netlist and an optical condition, when a charged particle beam is applied to the correction sample under the optical condition, compares the first application result and a second application result based on a detection signal when the charged particle beam is applied to the correction sample under the optical condition, and corrects the optical condition when the first application result and the second application result differ from each other.

Claims18

Dependent claims

A control method for a charged particle beam apparatus comprising:

estimating a circuit of a sample or a correction sample using a to-be-used-in-calculation device model under at least one optical condition in which a charged particle beam is applied to the sample or the correction sample;
generating a detection signal based on
secondary electrons emitted from the sample or the correction sample excited by the application of the charged particle beam which is applied to the sample or the correction sample under the at least one optical condition;
generating a to-be-used-in-computation netlist on a basis of the to-be-used-in-calculation device model corresponding to the correction sample:
estimating, on a basis of the to-be-used-in-computation netlist and the at least one optical condition, a first application result when the charged particle beam is applied to the correction sample under the at least one optical condition;
comparing, the first application result with a second application result based on the detection signal when the charged particle beam is applied to the correction sample under the at least one optical condition;
and
correcting the at least one optical condition when the first application result and the second application result differ from each other.

5 more elements

Dependencies are inferred from the claim text.

Facts

Application: 17/545,936Filed 8 Dec 2021
Priority: JP 2019-1461778 Aug 2019
Published: 31 Mar 2022
Term ends: Not estimatedThe source records don’t support an estimate.

Classification13 codes

H01J 37/22
Details: optical , image processing or photographic arrangements associated with the tube
G01N 23/2251
Using electron or ion: using incident electron beams, e.g. scanning electron microscopy [SEM]
H01J 37/244
Details: detectors; Associated components or circuits therefor
H01J 37/28
Electron or ion microscopes; Electron or ion diffraction tubes: with scanning beams

Family

Application16/927,932Continuation · filed 13 Jul 2020
Application17/545,936Continuation
US 11,398,366 B2Related patent
US 11,749,494 B2Related patent
US 2021/0043412 A1Published application
US 2022/0102108 A1This patent

From the US filing history. Foreign family members aren’t listed.