Processing apparatus and processing method
AssigneeTokyo Electron Limited
InventorKazuya IKEUE
Life of this patent
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Abstract
A processing apparatus configured to process a substrate includes a substrate holder having a substrate holding surface configured to attract and hold the substrate thereon; and an edge cleaning device configured to clean an edge portion of the substrate holding surface. Further, a processing method of processing a rear surface of the substrate by using the processing apparatus includes processing the rear surface of the substrate while a front surface of the substrate is attracted to and held by a substrate holding surface of a substrate holder; and cleaning an edge portion of the substrate holding surface.
Claims15
1-20. (canceled)
A processing apparatus configured to process a substrate, comprising:
- a substrate holder having a substrate holding surface configured to attract and hold the substrate thereon;
- a holder entire surface cleaning device configured to clean an entire surface of the substrate holder;
- and
- an edge cleaning device configured to clean an edge portion of the substrate holding surface,
- wherein the substrate holder is configured to be moved between a carry-in/out section where a carry-in/carry-out of the substrate is performed and a processing section where a processing of the substrate is performed, and
- the edge cleaning device and the holder entire surface cleaning device are provided in the carry-in/carry-out section.
A processing apparatus configured to process a substrate, comprising:
- a substrate holder having a substrate holding surface configured to attract and hold the substrate thereon;
- an entire surface cleaning device configured to clean an entire surface of the substrate;
- and
- an edge cleaning device configured to clean an edge portion of the substrate holding surface,
- wherein the substrate holder is configured to be moved between a carry-in/out section where a carry-in/carry-out of the substrate is performed and a processing section where a processing of the substrate is performed, and
- the edge cleaning device and the entire surface cleaning device are provided in the carry-in/carry-out section.
A processing apparatus configured to process a substrate, comprising:
- a substrate holder having a substrate holding surface configured to attract and hold the substrate thereon;
- a cleaning liquid supply configured to supply a cleaning liquid to the substrate held by the substrate holder;
- and
- an edge cleaning device configured to clean an edge portion of the substrate holding surface,
- wherein the substrate holder is configured to be moved between a carry-in/out section where a carry-in/carry-out of the substrate is performed and a processing section where a processing of the substrate is performed, and
- the cleaning liquid supply and the edge cleaning device are provided in the processing section.
A processing method of processing a substrate, comprising:
- processing the substrate while the substrate is attracted to and held by a substrate holding surface of a substrate holder;
- and
- cleaning an entire surface of the substrate holder and an edge portion of the substrate holding surface after the substrate held by the substrate holder is carried out.
Dependencies are inferred from the claim text.