Substrate container with enhanced flow field therein

A substrate container with enhanced flow field therein, comprising:

• a box having a front cover and a back panel opposing the front cover, a bottom panel connecting the front cover and the back panel, and a top panel connecting the front cover and the back panel, wherein the front cover, the back panel, the bottom panel and the top panel together define an internal receiving space;
• at least one offset inflation mechanism disposed outside the internal receiving space and having a gaseous chamber extending in the same direction as the bottom panel, wherein an inlet is disposed at an end of the gaseous chamber, wherein the inlet and the box are disposed on two opposing sides of the gaseous chamber, respectively, wherein at least one outlet penetrating the bottom panel is disposed at another end of the gaseous chamber, wherein the at least one outlet is positioned proximate to the back panel;
• and
• at least one gas diffusion mechanism adjoining the back panel and comprising a base, a partition wall and at least one diffusion member, wherein the base masks the at least one outlet to thereby form an auxiliary gaseous chamber, wherein the partition wall extends perpendicularly to the bottom panel to thereby form a vertical first gas channel, wherein the first gas channel is in communication with the auxiliary gaseous chamber, wherein the at least one diffusion member is disposed on at least one side of the partition wall, wherein the diffusion member and the partition wall together define a second gas channel, wherein the partition wall has at least one gap whereby the first gas channel and the second gas channel are in communication with each other.