Movable electrode for process chamber

A method of performing a process in a process chamber, the method comprising:

• providing RF power to a substrate support disposed in an inner volume of a process chamber to initiate a first plasma in the inner volume to perform a process on a substrate disposed on the substrate support, wherein the process chamber includes an electrode disposed above the substrate support and the electrode is located at a first position during the first plasma;
• moving the electrode vertically from the first position to a second position;
• and
• providing RF power to the electrode located in the second position to initiate a second plasma in the inner volume.

A process chamber, comprising:

• a chamber body enclosing an inner volume;
• a substrate support disposed in the inner volume;
• an electrode disposed above the substrate support;
• an actuator configured to move the electrode in the process chamber to vertically change a distance between the electrode and the substrate support by at least eight inches;
• and
• a bellows, wherein the chamber body comprises a lid disposed above the electrode and the bellows is disposed between the electrode and the lid.