Substrate cleaning device, substrate processing apparatus and substrate cleaning method

A substrate cleaning device comprising:

• a first substrate holder that holds an outer peripheral end of a substrate at a first height position without rotating the substrate;
• a second substrate holder that rotates the substrate about an axis extending in an up-and-down direction while holding the lower-surface center portion of the substrate by suction at a second height position further downward than the first height position;
• a substrate mover that moves the substrate between the first height position and the second height position;
• a cleaning tool that comes into contact with a lower surface of the substrate to clean the lower surface of the substrate;
• a cleaning tool lifter-lowerer that changes the cleaning tool between a first state where the cleaning tool comes into contact with the lower surface of the substrate held by the first substrate holder and a second state where the cleaning tool comes into contact with the lower surface of the substrate held by the second substrate holder, by lifting or lowering the cleaning tool;
• a cleaning tool mover that moves the cleaning tool in a horizontal direction with respect to the substrate at a position below the substrate held by the first or second substrate holder;
• a cleaning liquid supplier that supplies a cleaning liquid to the lower surface of the substrate;
• and
• a processing cup that is provided to surround the second substrate holder in a plan view, and receives the cleaning liquid splashed from the substrate in a case where the cleaning liquid is supplied from the cleaning liquid supplier to the substrate that is rotated while being held by suction by the second substrate holder, wherein
• the first height position is higher than an upper end portion of the processing cup, and
• the second height position is lower than the upper end portion of the processing cup when the substrate is cleaned by the cleaning tool while being held by the second substrate holder.

A substrate cleaning device comprising:

• a first substrate holder that holds an outer peripheral end of a substrate;
• a second substrate holder that holds a lower-surface center region of the substrate at a position farther downward than the first substrate holder;
• a receiver-transferer that receives and transfers the substrate between the first substrate holder and the second substrate holder;
• a cleaning tool that comes into contact with a lower surface of the substrate to clean the lower surface of the substrate;
• and
• a cleaning controller that controls the cleaning tool such that the lower-surface center region of the substrate is cleaned with a center of the substrate in a first position when the substrate is held by the first substrate holder, and controls the cleaning tool such that a lower-surface outer region surrounding the lower-surface center region of the substrate is cleaned with the center of the substrate in a second position below the first position when the substrate is held by the second substrate holder.

A substrate cleaning method including:

• cleaning a lower-surface center region of a substrate using a cleaning tool that comes into contact with a lower surface of the substrate with a center of the substrate in a first position, when an outer peripheral end of the substrate is held by a first substrate holder;
• cleaning a lower-surface outer region surrounding the lower-surface center region of the substrate using the cleaning tool with the center of the substrate in a second position below the first position, when the lower-surface center region of the substrate is held by a second substrate holder at a position farther downward than the first substrate holder;
• and
• receiving and transferring the substrate between the first substrate holder and the second substrate holder.