Showerhead for deposition tools having multiple plenums and gas distribution chambers
AssigneeLam Research Corporation
InventorsMichael J. JANICKI, Curtis W. BAILEY
Life of this patent
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Abstract
A deposition tool including a processing chamber, a substrate holder for holding a substrate to be processed within the processing chamber and a showerhead having a faceplate for distributing a first and/or second gas(es) and/or vapor(s) into the processing chamber. The showerhead includes first and second plenums, first and second chambers, each provided behind a backside of the faceplate, and first and second sets of holes, both formed through the faceplate of the showerhead, and in fluid communication with the first and second chambers respectively.
Claims34
A deposition tool, comprising:
- a processing chamber;
- a substrate holder configured to hold a substrate within the processing chamber;
- and
- a showerhead having a faceplate configured to distribute a first gas and/or vapor into the processing chamber, the showerhead comprising:
- a first plenum;
- a first chamber provided immediately behind a backside of the faceplate;
- and
- a first set of holes formed through the faceplate and in fluid communication with the first chamber.
A showerhead, comprising:
- a faceplate configured to distribute one or more of a first gas and/or vapor into a processing chamber;
- a first plenum;
- a first chamber provided immediately behind a backside of the faceplate in fluid communication with the first plenum;
- and
- a first set of holes formed through the faceplate and in fluid communication with the first chamber.
Dependencies are inferred from the claim text.