System and method for modeling a semiconductor fabrication process

A method comprising:

• generating an input image representing a shape of a design pattern;
• providing the input image to a machine learning model, the machine learning model being trained by using a plurality of pairs of images of a design pattern sample and a physical pattern sample, the physical pattern sample being formed from the design pattern sample using a semiconductor fabrication process;
• and
• generating output data defining a physical pattern corresponding to the design pattern based on an output image provided from the machine learning model.

A method comprising:

• generating an input image representing a shape of a physical pattern;
• providing the input image to a first machine learning model, the first machine learning model being trained by using a plurality of pairs of images of a physical pattern sample and a design pattern sample, the design pattern sample being used to form the physical pattern sample by using a semiconductor fabrication process;
• and
• generating output data defining a design pattern based on an output image provided from the first machine learning model.