Composition for forming pattern, cured film, laminate, pattern producing method, and method for manufacturing semiconductor element
AssigneeFUJIFILM Corporation
InventorYuichiro GOTO
Life of this patent
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Abstract
Provided are a composition for forming a pattern for imprinting, including (A) a polymerizable compound which contains an aromatic ring and does not contain a hydroxyl group, (B) a photopolymerization initiator which contains an aromatic ring and does not contain a hydroxyl group, and (C) a photopolymerization initiator which has a specific structure containing a hydroxyl group, in which a viscosity of components excluding a solvent from the composition for forming a pattern at 23° C. is 300 mPa·s or lower; a cured film to which the composition for forming a pattern is applied; a laminate; a pattern producing method; and a method for manufacturing a semiconductor element.
Claims20
A composition for forming a pattern for imprinting, comprising:
- (A) a polymerizable compound which contains an aromatic ring and does not contain a hydroxyl group;
- (B) a photopolymerization initiator which contains an aromatic ring and does not contain a hydroxyl group;
- and
- (C) a photopolymerization initiator represented by Formula (In-1),
- wherein a viscosity of components excluding a solvent from the composition for forming a pattern at 23° C. is 300 mPa·s or lower,
- in Formula (In-1), Ar represents an aromatic ring-containing group having an aromatic ring substituted with one or more substituents, where at least one of the substituents is an electron-donating group, at least one of the substituents includes —O— directly linked to the aromatic ring, and at least one of the substituents includes a hydroxyl group, and
- R1 represents an aliphatic hydrocarbon group substituted with one or more hydroxyl groups.
Dependencies are inferred from the claim text.