Integrated photonic device with improved optical coupling
AssigneeSTMicroelectronics (Crolles 2) SAS
InventorsFrederic BOEUF, Charles BAUDOT
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Abstract
A three-dimensional photonic integrated structure includes a first semiconductor substrate and a second semiconductor substrate. The first substrate incorporates a first waveguide and the second semiconductor substrate incorporates a second waveguide. An intermediate region located between the two substrates is formed by a one dielectric layer. The second substrate further includes an optical coupler configured for receiving a light signal. The first substrate and dielectric layer form a reflective element located below and opposite the grating coupler in order to reflect at least one part of the light signal.
Claims16
A three-dimensional photonic integrated structure, including:
- a first semiconductor substrate layer incorporating a first waveguide;
- a second semiconductor substrate layer incorporating a second waveguide;
- wherein the second semiconductor substrate layer comprises an optical coupler having a first side configured to receive a light signal;
- and
- an intermediate region located between the first and second semiconductor substrate layers and comprising at least one dielectric layer;
- and
- wherein the first semiconductor substrate layer and said at least one dielectric layer comprises a reflective element located below said optical coupler and opposite the first side of said optical coupler, the reflective element configured to reflect at least part of said light signal back towards said optical coupler;
- wherein the intermediate region further comprises an additional semiconductor layer coated by the at least one dielectric layer and located opposite the optical coupler, the reflective element further comprising said additional semiconductor layer.
A three-dimensional photonic integrated structure, including:
- a first insulating layer;
- a first semiconductor film supported by said first insulating layer, said first semiconductor film being patterned to form a first waveguide and a first film portion;
- a semiconductor layer positioned vertically above said first film portion;
- a second insulating layer including a first portion which is positioned between the semiconductor layer and said first film portion and including a second portion which covers the semiconductor layer and said first waveguide;
- a third insulating layer extending over the second insulating layer;
- a second semiconductor film supported by said third insulating layer, said second semiconductor film being patterned to form a second waveguide and an optical coupler, wherein said optical coupler is positioned vertically above said first film portion and said semiconductor layer;
- wherein the first film portion, the semiconductor layer and the first portion said second insulating layer form a reflective element located vertically below the optical coupler.
Dependencies are inferred from the claim text.