Apparatus and method for treating substrate

An apparatus for treating a substrate, the apparatus comprising:

• a body having an inner space in which the substrate is dried by a drying fluid in a supercritical state;
• a fluid supply unit configured to supply the drying fluid into the inner space;
• a fluid exhaust unit configured to release the drying fluid from the inner space;
• and
• a controller,
• wherein the fluid exhaust unit includes:
• a main exhaust line connected with the body;
• and
• a first exhaust valve configured to cause the drying fluid to selectively flow through the main exhaust line,
• wherein the controller is configured to perform:
• a pressure-raising step of raising pressure in the inner space to a set pressure;
• a flow step of maintaining the pressure in the inner space at the set pressure;
• and
• a vent step of lowering the pressure in the inner space, and
• wherein the controller is configured to control the fluid supply unit and the fluid exhaust unit such that the first exhaust valve remains turned on during the flow step.

An apparatus for treating a substrate, the apparatus comprising:

• a body having an inner space in which an organic solvent remaining on the substrate is dried by a drying fluid in a supercritical state;
• a fluid supply unit configured to supply the drying fluid into the inner space;
• a fluid exhaust unit configured to release the drying fluid from the inner space;
• and
• a controller,
• wherein the controller is configured to perform:
• a pressure-raising step of raising pressure in the inner space to a set pressure by supplying, by the fluid supply unit, the drying fluid into the inner space;
• a flow step of generating a flow of the drying fluid in the inner space by releasing, by the fluid exhaust unit, the drying fluid from the inner space while the fluid supply unit supplies the drying fluid into the inner space;
• and
• a vent step of lowering the pressure in the inner space by releasing, by the fluid exhaust unit, the drying fluid from the inner space, and
• wherein the controller is configured to control the fluid supply unit and the fluid exhaust unit such that an amount of the drying fluid supplied into the inner space per unit time by the fluid supply unit and an amount of the drying fluid released from the inner space per unit time by the fluid exhaust unit are the same as each other while the flow step is performed.