Substrate processing apparatus

Abstract

There is provided a technique that includes: a plurality of process chambers in which substrates are processed; a gas supplier configured to supply a gas to the process chambers; a plurality of process chamber exhaust pipes respectively connected to the plurality of process chambers; a common gas exhaust pipe disposed such that the respective process chamber exhaust pipes join together at downstream sides of the process chamber exhaust pipes; at least one detector configured to detect states of pressures in the process chamber exhaust pipes; and a plurality of inert gas supply pipes respectively connected to the process chamber exhaust pipes and configured to supply an inert gas into the process chamber exhaust pipes.

Dependencies are inferred from the claim text.