Polishing composition

A polishing composition for use in polishing a polishing object, the polishing composition comprising:

• water, an oxidant, and a polishing removal accelerator, wherein:
• the composition does not contain an abrasive;
• the oxidant consists of a composite metal oxide;
• a concentration C2 of the oxidant in the polishing composition is 0.05 mol/L or higher;
• the polishing removal accelerator contains at least one metal salt selected from the group consisting of an alkali metal salt and an alkaline earth metal salt;
• the metal salt is a normal salt that is generated by neutralization of a strong acid and a strong base;
• and
• a ratio (C1/C2) of a concentration C1 [mol/L] of the metal salt to the concentration C2 [mol/L] of the oxidant in the polishing composition is within a range of 0.001 to 70.

A polishing composition for use in polishing a polishing object, the polishing composition comprising:

• water, an oxidant, and a polishing accelerator, wherein:
• the composition does not include an abrasive;
• the oxidant is selected from the group consisting of permanganic acids and salts thereof, vanadic acids and salts thereof, and any combination thereof;
• a concentration C2 of the oxidant in the polishing composition is 0.05 mol/L or higher;
• the polishing accelerator contains at least one metal salt selected from the group consisting of an alkali metal salt and an alkaline earth metal salt;
• the metal salt is selected from the group consisting of lithium chloride, sodium chloride, potassium chloride, magnesium chloride, calcium chloride, strontium chloride, barium chloride, sodium bromide, potassium bromide, magnesium bromide, lithium nitrate, sodium nitrate, potassium nitrate, magnesium nitrate, calcium nitrate, strontium nitrate, barium nitrate, lithium sulfate, sodium sulfate, potassium sulfate, magnesium sulfate, calcium sulfate, strontium sulfate, and barium sulfate;
• and
• a ratio (C1/C2) of a concentration C1 [mol/L] of the metal salt to the concentration C2 [mol/L] of the oxidant in the polishing composition is within a range of 0.001 to 70.

A polishing composition for use in polishing a polishing object, the polishing composition comprising:

• water, an oxidant, and a polishing accelerator, wherein:
• the composition does not include an abrasive;
• the oxidant is selected from the group consisting of nitric acid, silver nitrate, aluminum nitrate, cerium ammonium nitrate, peroxomonosulfuric acid, peroxodisulfuric acid, persulfate potassium, chloric acid, salts of chloric acid, perchloric acid, potassium perchlorate, bromic acid, potassium bromate, iodic acid, ammonium iodate, sodium periodate, ferric acid, potassium ferrate, permanganic acid, sodium permanganate, potassium permanganate, chromic acid, potassium chromate, potassium dichromate, vanadic acid, ammonium vanadate, sodium vanadate, potassium vanadate, perruthenic acid, salts of perruthenic acid, molybdic acid, ammonium molybdate, disodium molybdate, perrhenic acid, salts of perrhenic acid, tungstic acid and disodium tungstate;
• the polishing accelerator contains an alkaline earth metal salt;
• the alkaline earth metal salt contains at least one selected from the group consisting of calcium and strontium;
• and
• the alkaline earth metal salt is a normal salt that is generated by neutralization of a strong acid and a strong base;
• and
• a ratio (C1/C2) of a concentration C1 [mol/L] of the alkaline earth metal salt to the concentration C2 [mol/L] of the oxidant in the polishing composition is within a range of 0.001 to 70.