Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, and method for manufacturing electronic device

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

• one or more specific compounds selected from the group consisting of a compound represented by General Formula (1), a compound represented by General Formula (2), and a compound represented by General Formula (3);
• and
• an acid-decomposable resin,
• in General Formula (1), X− represents an organic anion,
• Ar1 and Ar2 each independently represent an aromatic hydrocarbon ring group having at least one substituent, and
• Ar3 represents an aromatic hydrocarbon ring group represented by General Formula (1R),
• in General Formula (1R), * represents a bonding position,
• R1 to R5 each independently represent a hydrogen atom, a fluorine atom, or an alkyl group which may have a substituent,
• provided that at least one of R1 or R5 represents a fluorine-containing group selected from the group consisting of a fluorine atom and a fluoroalkyl group, and
• in General Formula (1), at least two of Ar1, Ar2, or Ar3 represent groups having different structures,
• in General Formula (2), X− represents an organic anion,
• Ar4 and Ar5 each independently represent an aromatic hydrocarbon ring group having at least one substituent,
• Ar6 represents an aromatic hydrocarbon ring group represented by General Formula (2R),
• in General Formula (2R), * represents a bonding position,
• R6, R7, R9, and R10 each independently represent a hydrogen atom, a fluorine atom, or an alkyl group which may have a substituent,
• R8 represents a fluorine-containing group selected from the group consisting of a fluorine atom and a fluoroalkyl group,
• provided that in General Formula (2), at least two of Ar4, Ar5, or Ar6 represent groups having different structures, and
• in General Formula (2), the aromatic hydrocarbon ring group represented by each of Ar4, Ar5, and Ar6 has a total of two or more fluorine-containing groups,
• in General Formula (3), X− represents an organic anion,
• Ar7 and Ar8 each independently represent an aromatic hydrocarbon ring group which may have an organic group other than an electron-withdrawing group,
• provided that the aromatic hydrocarbon ring group represented by each of Ar7 and Ar8 has a total of one or more organic groups other than an electron-withdrawing group,
• Ar9 represents an aromatic hydrocarbon ring group represented by General Formula (3R),
• in General Formula (3R), * represents a bonding position,
• R11, R13, and R15 each independently represent a hydrogen atom, a fluorine atom, or an alkyl group which may have a substituent, and
• R12 and R14 each independently represent a fluorine-containing group selected from the group consisting of a fluorine atom and a fluoroalkyl group.