Display device and method of manufacturing the same

A display device comprising:

• a substrate including an opening area, a display area surrounding the opening area, and a non-display area between the opening area and the display area;
• a first insulating layer arranged on the substrate;
• a display element arranged on the first insulating layer to overlap the display area and including a first electrode, an emission layer, and a second electrode that are sequentially stacked;
• an encapsulation layer covering the display element and extending from the display element to the non-display area, the encapsulation layer including a first inorganic encapsulation layer, an organic encapsulation layer, and a second inorganic encapsulation layer;
• and
• an intermediate pattern layer overlapping the non-display area and arranged between the first insulating layer and the encapsulation layer,
• wherein the first electrode and the intermediate pattern layer each include amorphous silicon (a-Si) to which a dopant is added.

A method of manufacturing a display device, the method comprising:

• preparing a display substrate including a substrate and a first insulating layer, the substrate including a non-display area and a display area, and the first insulating layer being arranged on the substrate;
• forming a first electrode overlapping the display area on the first insulating layer;
• forming a sacrificial pattern layer on the first insulating layer simultaneously with the first electrode, the sacrificial pattern layer overlapping the non-display area;
• forming at least one of a first functional layer and a second functional layer, and a second electrode on the first electrode and the sacrificial pattern layer;
• and
• removing the at least one of the first functional layer and the second functional layer, and the second electrode, which are arranged on the sacrificial pattern layer.