Manufacturing Method for Array Substrate and Array Substrate

A manufacturing method for an array substrate, comprising:

• depositing a gate metal layer on a base substrate, and forming a gate electrode from the gate metal layer by a first photolithography process;
• sequentially depositing a gate insulating layer, a first semiconductor layer, a second semiconductor layer, and a source/drain metal layer on the base substrate on which the gate electrode is formed, performing a second photolithography process such that an active island is formed by the first semiconductor layer and the second semiconductor layer while a source electrode and a drain electrode are formed by the source/drain metal layer and a channel region is formed between the source electrode and the drain electrode, and then performing an oxidation treatment on the channel region such that the second semiconductor layer located in the channel region is converted into a protective layer;
• depositing a passivation layer, and forming a conductive via hole on the passivation layer over the drain electrode by a third photolithography process;
• and
• depositing a transparent conductive layer, and performing a fourth photolithography process such that a pixel electrode is formed by the transparent conductive layer and that the pixel electrode communicates with the drain electrode through the conductive via hole.