Complementary metal-oxide semiconductor image sensor, image processing method and electronic device
AssigneeGuangdong Oppo Mobile Telecommunications Corp., Ltd.
InventorXin YANG
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AssigneeGuangdong Oppo Mobile Telecommunications Corp., Ltd.
InventorXin YANG
Estimating the term…
Disclosed are a CIS, an image processing method, and an electronic device. The CIS includes a color filter and a sub-wavelength pixel unit. The color filter includes a first light filter unit, a second light filter unit and a third light filter unit corresponding to first, second and third wavelength ranges, respectively. The sub-wavelength pixel unit includes a first photodiode (PD) column unit, a second PD column unit and a third PD column unit corresponding to the first, second and third wavelength ranges, respectively. A first light-receiving surface of the first PD column unit, a second light-receiving surface of the second PD column unit and a third light-receiving surface of the third PD column unit have equal area. First junction area of the first PD column unit, second junction area of the second PD column unit and third junction area of the third PD column unit are unequal.
A Complementary Metal-Oxide Semiconductor image sensor (CIS), comprising:
An image processing method applied to a Complementary Metal-Oxide Semiconductor image sensor (CIS), wherein the CIS comprises a color filter and a sub-wavelength pixel unit, the color filter comprises a first light filter unit corresponding to a first wavelength range, a second light filter unit corresponding to a second wavelength range, and a third light filter unit corresponding to a third wavelength range, the sub-wavelength pixel unit comprises a first photodiode (PD) column unit corresponding to the first wavelength range, a second PD column unit corresponding to the second wavelength range, and a third PD column unit corresponding to the third wavelength range, a first light-receiving surface of the first PD column unit, a second light-receiving surface of the second PD column unit, and a third light-receiving surface of the third PD column unit have equal area, first junction area of the first PD column unit, second junction area of the second PD column unit and third junction area of the third PD column unit are unequal, and the method comprises:
An electronic device, comprising a Complementary Metal-Oxide Semiconductor image sensor (CIS), wherein the CIS comprises:
Dependencies are inferred from the claim text.