Reactor with Centering Pin for Epitaxial Deposition

A substrate reactor for epitaxial deposition, the substrate reactor comprising:

• a) a vacuum chamber;
• b) a tube configured to rotate in the vacuum chamber around a tube geometrical center axis;
• c) a substrate carrier forming a pocket on a top surface, the pocket being dimensioned for holding at least one substrate, and forming an aperture with a frustoconical-shaped outer surface that is centrally located on a bottom surface;
• and
• d) a centering pin positioned along a geometrical center axis of rotation of the substrate carrier with a first end that forms a frustoconical-shaped outer surface that fits into the aperture with the frustoconical-shaped outer surface on the bottom surface of the substrate carrier, and a second end that is fixed inside the substrate reactor so that the substrate carrier rotates around the geometrical center axis of rotation of the substrate carrier independent of the tube geometrical center axis,
• wherein the substrate carrier is positioned proximate to a top surface of the tube forming a gap therebetween at room temperature, and the frustoconical-shaped outer surface of the aperture is in direct contact with the frustoconical-shaped outer surface of the first end of the centering pin so that a gap is formed in the vertical dimension between a tip of the first end of the centering pin and a surface of the aperture.

A substrate reactor for epitaxial deposition, the substrate reactor comprising:

• a) a vacuum chamber;
• b) a tube configured to rotate in the vacuum chamber around a tube geometrical center axis;
• c) a substrate carrier forming a pocket on a top surface, the pocket being dimensioned for holding at least one substrate, and forming an aperture that is centrally located on a bottom surface, the aperture having secured therein a bushing, wherein the bushing has a center opening positioned along a geometrical center axis of rotation of the substrate carrier, the substrate carrier being positioned on and in contact with a top surface of the tube;
• and
• d) a centering pin positioned along a geometrical center axis of rotation of the substrate carrier, the centering pin having a first end positioned in the bushing, and a second end being fixed inside the reactor so that the substrate carrier rotates around the geometrical center axis of the substrate carrier independent of the geometrical center axis of the tube.