Substrate processing system and state monitoring method
AssigneeTokyo Electron Limited
InventorToshiaki KODAMA
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AssigneeTokyo Electron Limited
InventorToshiaki KODAMA
Estimating the term…
A substrate processing system includes a substrate processing apparatus configured to process a substrate, a substrate transfer mechanism including a substrate holder configured to hold the substrate, an imaging device provided in the substrate transfer mechanism and configured to image a monitoring target member inside the substrate processing apparatus, and a controller. The controller is configured to cause the imaging device to image multiple portions of the monitoring target member, including a central portion facing a center of the substrate during processing and a peripheral edge portion facing a peripheral edge side of the substrate during the processing, by moving the substrate holder, and calculate, for each of the multiple portions of the monitoring target member, a physical amount indicating a state of the corresponding portion based on an imaging result.
A substrate processing system comprising:
A method of monitoring a state of a member within a substrate processing apparatus in a substrate processing system including the substrate processing apparatus and a substrate transfer mechanism,
Dependencies are inferred from the claim text.