Substrate processing method and substrate processing apparatus

A substrate processing apparatus comprising:

• a substrate holder configured to rotatably hold a substrate;
• a processing liquid supply configured to supply a processing liquid to a surface of the substrate;
• a solvent supply configured to supply a molding solvent to a surface of the substrate;
• and
• a controller configured to control the substrate holder, the processing liquid supply, and the solvent supply to perform a process including:
• supplying a processing liquid to a peripheral edge of a surface of a substrate to form a processing film on the peripheral edge of the surface of the substrate;
• and
• bringing a molding solvent supplied to an inner region than a region of the surface of the substrate to which the processing liquid is supplied, into contact with an interface of the processing liquid that faces a central side of the surface.