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US 2022/0068634 A1Published application
Method of cleaning a surface
AssigneeASM IP Holding B.V.
InventorsShaoren Deng, Andrea Illiberi, Daniele Chiappe, Eva Tois, Giuseppe Alessio Verni, Michael Givens, Varun Sharma, Chiyu Zhu, Shinya Iwashita, Charles Dezelah, Viraj Madhiwala, Jan Willem Maes, Marko Tuominen, Anirudhan Chandrasekaran
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Abstract
Methods for cleaning a substrate are disclosed. The substrate comprises a dielectric surface and a metal surface. The methods comprise providing a cleaning agent to the reaction chamber.
Claims20
A method for cleaning a substrate, the method comprising:
- providing a substrate comprising a dielectric and an oxidized metal surface, to a reaction chamber;
- providing a reducing agent to the reaction chamber, thereby contacting the substrate with the reducing agent and converting the oxidized metal surface to a metal surface;
- providing an oxidizing agent to the reaction chamber, thereby contacting the substrate with the oxidizing agent and oxidizing any metal contaminants on the dielectric surface, thus forming oxidized metal contaminants;
- and,
- providing a cleaning agent to the reaction chamber, thereby contacting the substrate with the cleaning agent and removing the oxidized metal contaminants from the substrate.
2 more elements
Dependencies are inferred from the claim text.