Wafer support and equipment for thin-film deposition or pre-cleaning using the same
AssigneeSky Tech Inc.
InventorsJING-CHENG LIN, Yao-Syuan Cheng
Life of this patent
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AssigneeSky Tech Inc.
InventorsJING-CHENG LIN, Yao-Syuan Cheng
Estimating the term…
The present disclosure provides an equipment for thin-film deposition or pre-cleaning which includes a chamber, a support pedestal, a fixing ring and a plurality of fixing members, wherein the support pedestal, the fixing ring and the fixing members are positioned within the chamber. The support pedestal has a supporting surface that supports a wafer, the fixing ring is connected to the support pedestal and surrounds the support pedestal and the wafer. When the fixing ring is disposed on the support pedestal, the fixing members contact the wafer, to fix the wafer on the support pedestal. The supporting surface of the support pedestal is at a height level same as or lower than the upper surface of the fixing ring is, to prevent the fixing ring from blocking an edge area of the wafer, to facilitate forming an evenly-distributed and steady plasma.
An equipment for thin-film deposition or pre-cleaning, comprising:
An equipment for thin-film deposition or pre-cleaning, comprising:
A wafer support, comprising:
Dependencies are inferred from the claim text.