Vacuum treatment apparatus and method for vacuum plasma treating at least one substrate or for manufacturing a substrate

1) A vacuum plasma treatment apparatus comprising, within a vacuum recipient a substrate carrier, at least one first and at least one second plasma electrode for generating a plasma therebetween;

• said first and second plasma electrodes being connectable to an electric plasma supply source arrangement establishing a first electric potential to said first plasma electrode and a second electric potential to said second plasma electrode, said first and said second electric potentials may both be set independently with respect to a system ground potential;
• at least said first plasma electrode comprising an electrode body with an outer, patterned surface comprising first surface areas noncontributing to plasma electrode effect and being of a metallic material or of a dielectric material and second surface areas being plasma electrode effective and being of a metallic material or the surface of a dielectric material layer deposited on metallic material, said metallic material being operated on said first electric potential.