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US 2022/0068536 A1Published application
Composition and method of making a monolithic heterostructure of multiferroic thin films
AssigneeBoston Applied Technologies, Incorporated
InventorsXiaomei Guo, Kewen Kevin Li, Yingyin Kevin Zou, Hua Jiang
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Abstract
A monolithic multiferroic heterostructure fabricated using CSD (chemical solution deposition) is disclosed. The monolithic heterostructure includes a substrate, a ferromagnetic layer, a ferroelectric layer, and one or more seed layers that enhance crystallinity and promote high frequency performance.
Claims21
A monolithic multiferroic heterostructure, comprising:
- a substrate;
- a buffer layer disposed above the substrate;
- a seed layer disposed above the buffer layer;
- a ferromagnetic (FM) layer disposed above and in direct contact with the seed layer;
- and
- a ferroelectric (FE) layer disposed above the FM layer.
3 more elements
A method of fabricating a monolithic multiferroic heterostructure, the method comprising:
- forming a plurality of layers on a substrate via multiple cycles of depositing, drying, firing, and cooling, the plurality of layers including a seed layer, a ferromagnetic (FM) layer formed directly upon the seed layer, and a ferroelectric (FE) layer above the FM layer,
- wherein forming the seed layer includes depositing a seed precursor solution onto the substrate, and
- wherein forming the FM layer includes depositing an FM precursor solution onto the substrate, the FM precursor solution and the seed precursor solution sharing a common set of ingredients.
Dependencies are inferred from the claim text.