Substrate treating apparatus and substrate treating method
AssigneeSemes Co., Ltd.
InventorsOHYEOL KWON, SOO YEON SHIN, JIHYUN LEE, CHANG YUL CHO
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AssigneeSemes Co., Ltd.
InventorsOHYEOL KWON, SOO YEON SHIN, JIHYUN LEE, CHANG YUL CHO
Estimating the term…
Disclosed is a substrate treating apparatus. The substrate treating apparatus includes an imaging unit that photographs loci of the one or more discharge liquids discharged from the plurality of nozzles, and an inspection unit that calculates impact points of the one or more discharge liquids discharged from the plurality of nozzles and determines whether the impact points of the one or more discharge liquids discharged from the plurality of nozzles are normal. The inspection unit includes an image synthesizing unit that synthesizes a plurality of images captured by the imaging unit, a pre-processing unit that pre-processes image data generated through the image synthesizing unit, and a calculation unit that calculates whether the impact points of the one or more discharge liquids discharged from the plurality of nozzles are normal by comparing the image data pre-processed by the pre-processing unit.
A substrate treating apparatus for treating a substrate through one or more discharge liquids discharged from a plurality of nozzles to the substrate, the substrate treating apparatus comprising:
Dependencies are inferred from the claim text.