Apparatus and method for cleaning a support structure in a lighographic system
AssigneeASML Holding N.V.
InventorKeane Michael LEVY
Life of this patent
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Abstract
Apparatus for and method of removing a contaminant from a working surface of a lithography support such as a reticle or wafer stage in an EUV or a DUV photolithography system in which abase supporting the substrate is provided with a surface profile so as to be thicker towards a middle portion of the base so that when a substrate supported by the base is pressed between the working surface and the base the contaminant is transferred from the working surface to the substrate.
Claims20
-20.
A apparatus for use in a system for generating radiation for photolithography, an apparatus comprising a base arranged to support a substrate on a first surface of the base, the first surface being configured to have a surface profile that is higher at a middle portion of the first surface than at a laterally peripheral portion of the first surface.
A apparatus for in system for generating radiation for photolithography, an apparatus comprising a substrate, a base arranged to support the substrate on a first surface of the base, the substrate being supported in a manner such that a middle portion of a top surface of the substrate extends vertically farther from the base than a peripheral portion of the substrate.
A method of removing a contaminant from a working surface of a clamping structure in a photolithography tool, the method comprising the steps of:
- supporting a substrate on a working surface of a base, the first surface being configured to have a surface profile that is higher at a middle portion of the first surface than at a laterally peripheral portion of the first surface;
- compressing the substrate between the base and the working surface;
- rocking the working surface with respect to the base;
- and
- withdrawing the substrate away from the working surface.
Dependencies are inferred from the claim text.