Compensation method for overlay deviation

A compensation method for overlay deviation, comprising:

• obtaining x first inspection distribution maps, wherein each first inspection distribution map includes a plurality of inspection sites, each inspection site at least includes one inspection position, inspection positions in the x first inspection distribution maps are not repeated with each other, and x is a natural number greater than or equal to two;
• and
• performing a first iteration on wafers of an n-th lot according to the x first inspection distribution maps to obtain an n-th high-order overlay deviation model, wherein the wafers of the n-th lot include a plurality of n-th wafers, n is a natural number greater than or equal to one, and performing the first iteration includes:
• obtaining x n-th wafers to be inspected from the wafers of the n-th lot;
• allocating the x first inspection distribution maps, wherein each n-th wafer to be inspected corresponds to one first inspection distribution map;
• obtaining an n-th overlay accuracy information of each n-th wafer to be inspected according to a corresponding first inspection distribution map;
• and
• obtaining the n-th high-order overlay deviation model according to the x n-th overlay accuracy information.