Method and hardware for post maintenance vacuum recovery system

A method for monitoring vacuum chamber moisture content, the method comprising:

• causing, by a computing system, a measurement cycle comprising:
• causing a pump to pump down pressure of a semiconductor processing chamber for a set duration of time;
• causing an isolation valve to isolate the semiconductor processing chamber;
• receiving hydrogen, oxygen, or hydroxyl related sensor data from an optical emission sensor;
• and
• analyzing the hydrogen, oxygen, or hydroxyl sensor data to determine whether the hydrogen, oxygen, or hydroxyl sensor data satisfies one or more sensor data criteria;
• causing, by the computing system, one or more repetitions of the measurement cycle until the hydrogen, oxygen, or hydroxyl sensor data meets the one or more sensor data criteria;
• and
• analyzing the hydrogen, oxygen, or hydroxyl sensor data that meets the one or more sensor data criteria to determine vacuum chamber moisture content.

A system, comprising:

• a vacuum chamber comprising a body coupled to an isolation valve configured to isolate a cavity formed by the body;
• an optical emission sensor mounted onto the isolation valve, the optical emission sensor configured to generate sensor data corresponding to emission of one or more gases from the cavity;
• a pump coupled to the vacuum chamber, the pump configured to manipulate pressure in the vacuum chamber;
• and
• a computing system configured to:
• cause a measurement cycle comprising:
• cause the pump to pump down pressure of the vacuum chamber for a set duration of time;
• cause the isolation valve to isolate the vacuum chamber;
• receive sensor data from the optical emission sensor;
• analyze the sensor data to determine whether the sensor data satisfies one or more sensor data criteria;
• and
• cause one or more repetitions of the measurement cycle until the sensor data meets the one or more sensor data criteria;
• and
• analyze the sensor data that meets the sensor data criteria to determine at least one of vacuum chamber leak rate or vacuum chamber moisture content.