Vacuum processing apparatus

A vacuum processing apparatus which performs plasma processing, the vacuum processing apparatus comprising:

• an electrode flange connected to a high-frequency power supply;
• a shower plate spaced apart from and facing the electrode flange and serving as a cathode together with the electrode flange;
• an insulating shield provided around the shower plate;
• a processing chamber in which a processing-target substrate is to be disposed in an opposite side of the shower plate opposite with respect to the electrode flange;
• an electrode frame attached to the shower plate side of the electrode flange;
• and
• a slide plate attached to a circumferential edge portion of the shower plate on the electrode frame side, wherein
• the shower plate is formed to have a substantially rectangular outline,
• the electrode frame and the slide plate are slidable in response to thermal deformation that occurs when a temperature of the shower plate is raised or lowered, and a space surrounded by the shower plate, the electrode flange, and the electrode frame is sealable, and
• the electrode frame comprises:
• a frame-shaped upper plate surface portion attached to the electrode flange;
• a vertical plate surface portion provided to stand toward the shower plate from an entire outer circumference of an outline of the upper plate surface portion;
• and
• a lower plate surface portion extending substantially parallel to the upper plate surface portion from a lower end of the vertical plate surface portion toward an inner end of the outline of the upper plate surface portion.