Solid vaporization/supply system of metal halide for thin film deposition

A solid vaporization/supply system of metal halide for thin film deposition comprising a vaporizable source material container for storing and vaporizing a metal halide for thin film deposition to be used as a vaporizable source material, and comprising a buffer tank coupled with the vaporizable source material container,

• the vaporizable source material container comprising:
• a container main body including a container wall;
• a lid body configured to be detachably fixed to the container main body, and provided with a carrier gas inlet for introducing a carrier gas into the container main body and a mixed gas outlet for leading a mixed gas of the vaporized metal halide for thin film deposition with the carrier gas to the outside;
• fastening members for fixing the container main body with the lid body;
• and
• joint members arranged at the carrier gas inlet and the mixed gas outlet of the lid body,
• wherein the container wall of the container main body is configured to have a double-wall structure composed of an inner wall member and an outer wall member, thus allowing the carrier gas introduced from the carrier gas inlet to be led into the container main body via a space between the inner and outer wall members of the double-wall structure,
• wherein the container wall of the container main body is fabricated of copper with 99 to 99.9999% purity, aluminum with 99 to 99.9999% purity, or titanium with 99 to 99.9999% purity, and
• wherein the container main body, the lid body, the fastening members, and the joint members are each treated by fluorocarbon polymer coating and/or by electrolytic polishing on its surface.