Polishing composition, concentrated liquid thereof, and polishing method using the same
AssigneeFujimi Incorporated
InventorYoshihiro IZAWA
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Abstract
An object of the present invention is to provide a means for reducing the surface roughness (Ra) and suppressing occurrence of scratches while maintaining a high polishing rate in polishing an object to be polished containing a resin. Provided is a polishing composition including particulate alumina and a dispersing medium, in which an α conversion rate of the particulate alumina is 50% or more, and a sphericity of the particulate alumina is 80% or more.
Claims14
A polishing composition comprising particulate alumina and a dispersing medium, in which an α conversion rate of the particulate alumina is 50% or more, and a sphericity of the particulate alumina is 80% or more.
Dependencies are inferred from the claim text.