Electron Beam Observation Device, Electron Beam Observation System, and Image Correcting Method and Method for Calculating Correction Factor for Image Correction in Electron Beam Observation Device

A correction factor calculation method in an electron beam observation device for correcting images among a plurality of the electron beam observation devices each of which generates an image by irradiating an electron beam over a specimen, the method comprising the steps of:

• allowing a first electron beam observation device to generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen;
• allowing a second electron beam observation device to generate a second image data by irradiating a second electron beam over the first and second patterns;
• and
• allowing one of the first and second electron beam observation devices to calculate a correction factor at a frequency selectively extracted from first and second frequency characteristics calculated based on the first and second image data.

A method in an electron beam observation device for correcting images among a plurality of the electron beam observation devices each of which generates an image by irradiating an electron beam over a specimen, the method comprising the steps of:

• allowing a first electron beam observation device to generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen;
• allowing a second electron beam observation device to generate a second image data by irradiating a second electron beam over the first and second patterns;
• allowing one of the first and second electron beam observation devices to calculate a correction factor at a frequency selectively extracted from first and second frequency characteristics calculated based on the first and second image data;
• and
• allowing one of the first and second electron beam observation devices to use the correction factor and correct a third image data acquired by one of the first and second electron beam observation devices.

An electron beam observation system including a plurality of electron beam observation devices that generate images by irradiating an electron beam over a specimen,

• wherein a first electron beam observation device includes a first computer system that generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen;
• wherein a second electron beam observation device includes a second computer system that generates a second image data by irradiating a second electron beam over the first and second patterns;
• wherein one of the first and second computer systems calculates a correction factor at a frequency selectively extracted from first and second frequency characteristics calculated based on the first and second image data;
• and
• wherein one of the first and second computer systems uses the correction factor and corrects a third image data acquired by one of the first and second electron beam observation devices.

A correction factor calculation method in an electron beam observation device for correcting images among a plurality of the electron beam observation devices each of which generates an image by irradiating an electron beam over a specimen, the method comprising the steps of:

• allowing a first electron beam observation device to generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen;
• allowing the first electron beam observation device to calculate a first frequency characteristic based on the first image data;
• allowing a second electron beam observation device to generate a second image data by irradiating a second electron beam over the first and second patterns;
• allowing the second electron beam observation device to calculate a second frequency characteristic based on the second image data;
• and
• allowing one of the first and second electron beam observation devices to calculate a correction factor at a frequency selectively extracted from the first and second frequency characteristics.

A method in an electron beam observation device for correcting images among a plurality of the electron beam observation devices each of which generates an image by irradiating an electron beam over a specimen, the method comprising the steps of:

• allowing a first electron beam observation device to generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen;
• allowing the first electron beam observation device to calculate a first frequency characteristic based on the first image data;
• allowing a second electron beam observation device to generate a second image data by irradiating a second electron beam over the first and second patterns;
• allowing the second electron beam observation device to calculate a second frequency characteristic based on the second image data;
• allowing one of the first and second electron beam observation devices to calculate a correction factor at a frequency selectively extracted from the first and second frequency characteristics;
• and
• allowing one of the first and second electron beam observation devices to use the correction factor and correct a third image data acquired by one of the first and second electron beam observation devices.

An electron beam observation system including a plurality of electron beam observation devices that generate images by irradiating an electron beam over a specimen,

• wherein a first electron beam observation device includes a first computer system that generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, and calculates a first frequency characteristic based on the first image data, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen;
• wherein a second electron beam observation device includes a second computer system that generates a second image data by irradiating a second electron beam over the first and second patterns and calculates a second frequency characteristic based on the second image data;
• wherein one of the first and second computer systems calculates a correction factor at a frequency selectively extracted from the first and second frequency characteristics;
• and
• wherein one of the first and second computer systems uses the correction factor and corrects a third image data acquired by one of the first and second electron beam observation devices.

A correction factor calculation method for correcting images among a plurality of electron beam observation devices in an electron beam observation system including the electron beam observation device to generate an image by irradiating an electron beam over a specimen and a computer system configured to be communicable with a plurality of the electron beam observation devices, the method comprising the steps of:

• allowing a first electron beam observation device to generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen;
• allowing a second electron beam observation device to generate a second image data by irradiating a second electron beam over the first and second patterns;
• and
• allowing the computer system to calculate a correction factor at a frequency selectively extracted from first and second frequency characteristics calculated based on the first and second image data.

A method for correcting images among a plurality of electron beam observation devices in an electron beam observation system including the electron beam observation device to generate an image by irradiating an electron beam over a specimen and a computer system configured to be communicable with a plurality of the electron beam observation devices, the method comprising the steps of:

• allowing a first electron beam observation device to generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen;
• allowing a second electron beam observation device to generate a second image data by irradiating a second electron beam over the first and second patterns;
• allowing the computer system to calculate a correction factor at a frequency selectively extracted from first and second frequency characteristics calculated based on the first and second image data;
• and
• allowing one of the first and second electron beam observation devices to use the correction factor and correct a third image data acquired by one of the first and second electron beam observation devices.

An electron beam observation system comprising:

• an electron beam observation device to generate an image by irradiating an electron beam over a specimen;
• and
• a third computer system configured to be communicable with a plurality of the electron beam observation devices,
• wherein a first electron beam observation device includes a first computer system that generates a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen;
• wherein a second electron beam observation device includes a second computer system that generates a second image data by irradiating a second electron beam over the first and second patterns;
• wherein the third computer system calculates a correction factor at a frequency selectively extracted from first and second frequency characteristics calculated based on the first and second image data;
• and
• wherein one of the first and second computer systems uses the correction factor and corrects a third image data acquired by one of the first and second electron beam observation devices.

A correction factor calculation method for correcting images among a plurality of electron beam observation devices in an electron beam observation system including the electron beam observation device to generate an image by irradiating an electron beam over a specimen and a computer system configured to be communicable with a plurality of the electron beam observation devices, the method comprising the steps of:

• allowing a first electron beam observation device to generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen;
• allowing the first electron beam observation device to calculate a first frequency characteristic based on the first image data;
• allowing a second electron beam observation device to generate a second image data by irradiating a second electron beam over the first and second patterns;
• allowing the second electron beam observation device to calculate a second frequency characteristic based on the second image data;
• allowing the computer system to specify a reference frequency characteristic based on the first and second frequency characteristics;
• and
• allowing one of the first and second electron beam observation devices to calculate a correction factor at a frequency selectively extracted from the reference frequency characteristic and one of the first and second frequency characteristics.

A method for correcting images among a plurality of electron beam observation devices in an electron beam observation system including the electron beam observation device to generate an image by irradiating an electron beam over a specimen and a computer system configured to be communicable with a plurality of the electron beam observation devices, the method comprising the steps of:

• allowing a first electron beam observation device to generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen;
• allowing the first electron beam observation device to calculate a first frequency characteristic based on the first image data;
• allowing a second electron beam observation device to generate a second image data by irradiating a second electron beam over the first and second patterns;
• allowing the second electron beam observation device to calculate a second frequency characteristic based on the second image data;
• allowing the computer system to specify a reference frequency characteristic based on the first and second frequency characteristics;
• allowing one of the first and second electron beam observation devices to calculate a correction factor at a frequency selectively extracted from the reference frequency characteristic and one of the first and second frequency characteristics;
• and
• allowing one of the first and second electron beam observation devices to use the correction factor and correct a third image data acquired by one of the first and second electron beam observation devices.

A method for correcting images among a plurality of electron beam observation devices in an electron beam observation system that includes an electron beam observation device to generate an image by irradiating an electron beam over a specimen and a third computer system configured to be communicable with among a plurality of the electron beam observation devices,

• wherein a first electron beam observation device includes a first computer system that generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, and calculates a first frequency characteristic based on the first image data, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen;
• wherein a second electron beam observation device includes a second computer system that generates a second image data by irradiating a second electron beam over the first and second patterns and calculates a second frequency characteristic based on the second image data;
• wherein the third computer system specifies a reference frequency characteristic based on the first and second frequency characteristics;
• wherein one of the first and second computer systems calculates a correction factor at a frequency selectively extracted from the reference frequency characteristic and one of the first and second frequency characteristics;
• and
• wherein one of the first and second computer systems uses the correction factor and corrects a third image data acquired by one of the first and second electron beam observation devices.

A correction factor calculation method for correcting an image in an electron beam observation device that generates an image by irradiating a plurality of electron beams over a specimen, the method comprising the steps of:

• allowing a first electron beam observation device to generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen;
• generating a second image data by irradiating a second electron beam over the first and second patterns;
• and
• calculating a correction factor at a frequency selectively extracted from first and second frequency characteristics calculated based on the first and second image data.

A method for correcting an image in an electron beam observation device that generates an image by irradiating a plurality of electron beams over a specimen, the method comprising the steps of:

• allowing a first electron beam observation device to generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen;
• generating a second image data by irradiating a second electron beam over the first and second patterns;
• calculating a correction factor at a frequency selectively extracted from first and second frequency characteristics calculated based on the first and second image data;
• and
• using the correction factor and correcting a third image data acquired by the electron beam observation device.

An electron beam observation device that generates an image by irradiating a plurality of electron beams over a specimen,

• wherein the electron beam observation device
• generate a first image data by irradiating a first electron beam over a first pattern and a second pattern differing from the first pattern in a shape or a size, in which the first pattern and the second pattern are included in a specimen, or the first pattern is included in a first specimen and the second pattern is included in a second specimen;
• generates a second image data by irradiating a second electron beam over the first and second patterns;
• calculates a correction factor at a frequency selectively extracted from first and second frequency characteristics calculated based on the first and second image data;
• and
• uses the correction factor and corrects a third image data acquired by the electron beam observation device.