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US 2022/0048156 A1Published application
Polishing pad assembly
OwnerSteven Anneker, David Bonaserainventors
Life of this patent
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Abstract
The present invention is directed to a method and apparatus for polishing stone and synthetic substrates. The apparatus uses a leather polishing pad to apply a finish to a stone or synthetic substrate. The pad has a specially designed fluid channeling pattern which cools by maintaining a quantity of liquid polishing slurry centrally of the pad for cooling purposes. The grit and amount of the abrasive used with the slurry varies based on the mechanical properties of the substrate.
Claims7
A polishing pad assembly for use with a sanding machine comprising:
- a first pad, said first pad having an outer covering, said outer covering formed of two sheets of material attached centrally and peripherally to create an inner sleeve;
- a water channeling component having a series of channels formed therein;
- a water impervious component attached to said water channeling component;
- said water channeling component and said water impervious component enclosed within said inner sleeve.
1 more element
Dependencies are inferred from the claim text.