# US 2022/0034751 A1 · Optical measurement method and system and optical device manufacturing system

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- Number: US 2022/0034751 A1
- Document ID: US20220034751A1
- Status: Published application
- Kind: A1
- Application number: 17/298,662
- Filed: 2019-03-21
- Published: 2022-02-03
- Earliest claimed: 2018-12-03
- Assignees: Shanghai Intelight Electronic Technology Co., Ltd.; Jiangsu Intelight Electronic Technology Co., Ltd.
- Applicants: Shanghai Intelight Electronic Technology Co., Ltd.; Jiangsu Intelight Electronic Technology Co., Ltd.
- Inventors: Shunyi TAN
- Web page: https://patentgrep.com/patent/US20220034751A1

## CPC

- G01M 11/0257: {by analyzing the image formed by the object to be tested}
- G01M 11/0207: {Details of measuring devices}
- G01M 11/0264: {by using targets or reference patterns}
- G02B 27/62: Optical apparatus specially adapted for adjusting optical elements during the assembly of optical systems
- G01M: TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS

## Abstract

An optical measurement method and system and an optical device manufacturing system are provided. The optical measurement system includes an image generation system, an image measurement system and a control system. The image generation system is configured for generating test image information and outputting light containing the test image information to a device under test. The image measurement system is configured for obtaining detected image information according to the light passing through the device under test. The control system is configured for obtaining an aberration parameter according to imaging quality of the detected image information. The optical measurement method and system and an optical device manufacturing system can simulate any wavefront, and an assembled lens element can be simulated directly according to the compensation of an unassembled lens element to achieve a final imaging effect.

## Claims

### Claim 1

An optical measurement system, comprising:
an image generation system configured for generating test image information and outputting light containing the test image information to a device under test;
an image measurement system configured for obtaining detected image information according to the light passing through the device under test; and
a control system configured for calculating and/or selecting the test image information and outputting the test image information to the image generation system.

### Claim 2 (depends on 1)

The optical measurement system according to claim 1, wherein the control system obtains an aberration parameter according to imaging quality of the detected image information.

### Claim 3 (depends on 2)

The optical measurement system according to claim 2, wherein the control system comprises:
a standard judging system configured for judging whether a parameter measured meets a judging standard or not; outputting a measurement result if the parameter measured meets the judging standard; and if the parameter measured does not meet the judging standard, obtaining a compensation parameter according to a current aberration parameter and superposing the compensation parameter to current test image information for compensation, wherein the image generation system generates compensated test image information.

### Claim 4 (depends on 1)

The optical measurement system according to claim 1, wherein the test image information comprises a hologram or a phase hologram of a modulated wavefront.

### Claim 5 (depends on 1)

The optical measurement system according to claim 1, wherein the test image information accounts for all or part of a target image height of the device under test; and/or the test image information accounts for all or part of a target field of view of the device under test.

### Claim 6 (depends on 4)

The optical measurement system according to claim 4, wherein the image generation system separately generates the test image information for setting wavefront modulation, different parts corresponding to a target image height of the device under test and/or different parts of a target field of view; and the test image information is output repeatedly and successively in form of different parameters and/or target objects.

### Claim 7 (depends on 1)

The optical measurement system according to claim 1, wherein the image generation system comprises at least one spatial light modulator, and a plurality of spatial light modulators comprise phase spatial light modulators and/or intensity spatial light modulators.

### Claim 8

(canceled)

### Claim 9

(canceled)

### Claim 10

(canceled)

### Claim 11

(canceled)

### Claim 12 (depends on 1)

The optical measurement system according to claim 1, wherein the image generation system comprises any one or more of optical components comprising a light source, a lens, an optical stop, a rotator, a wave plate, a polarizer and a prism.

### Claim 13

(canceled)

### Claim 14

(canceled)

### Claim 15

(canceled)

### Claim 16 (depends on 1)

The optical measurement system according to claim 1, wherein the control system obtains the test image information by a real-time calculation or reading according to an input image and/or wavefront information and outputs the test image information to the image generation system, wherein the image generation system generates the test image information physically to modulate a needed light wavefront and/or a needed light field.

### Claim 17 (depends on 16)

The optical measurement system according to claim 16, wherein the control system performs the real-time calculation or reading according to a feedback of the image measurement system.

### Claim 18

(canceled)

### Claim 19 (depends on 3)

The optical measurement system according to claim 3, wherein the measurement result comprises any one or more of parameters comprising MIT in a same field of view, MTFs in different fields of view, the aberration parameter, a chromatic aberration parameter and a focal length.

### Claim 20

An optical measurement method, generating test image information and adding wavefront compensation into the test image information.

### Claim 21 (depends on 20)

The optical measurement method according to claim 20, wherein the wavefront compensation is configured for compensating an aberration existing in a device under test, and/or the wavefront compensation is configured for compensating a missing part in a device under test.

### Claim 22

(canceled)

### Claim 23 (depends on 20)

The optical measurement method according to claim 20, wherein the wavefront compensation is implemented by obtaining a wavefront and simulating the wavefront by using the image generation system, wherein the wavefront is set to be propagated to the surface of the device under test, an exit/entrance pupil of a system or an optical stop position of the system.

### Claim 24 (depends on 20)

The optical measurement method according to claim 20, wherein the wavefront is calculated by reversely propagating the wavefront of an image to an exit/entrance pupil of the system, the optical stop position of a system or the image generation system.

### Claim 25

(canceled)

### Claim 26 (depends on 20)

The optical measurement method according to claim 20, wherein the wavefront compensation is calculated by adopting a Zernike polynomial and/or a Seidal polynomial.

### Claim 27

(canceled)

### Claim 28 (depends on 20)

The optical measurement method according to claim 20, wherein a hologram or a phase hologram is generated by adding the wavefront for compensation to the wavefront of a propagated test image.

### Claim 29 (depends on 1)

An optical device manufacturing system, comprising the optical measurement system of claim 1.

### Claim 30 (depends on 29)

The optical device manufacturing system according to claim 29, comprising an optical device moving system, wherein the optical device moving system translates and/or rotates an optical device according to imaging quality of the detected image information obtained by the light passing through the device under test.

### Claim 31 (depends on 30)

The optical device manufacturing system according to claim 30, comprising an optical device machining system, wherein the optical device processing system processes the optical device according to the imaging quality of the detected image information obtained by the light passing through the device under test.

### Claim 32

(canceled)