Gate unit and manufacturing method thereof, array substrate manufacturing method, and display mechanism

A method of manufacturing an array substrate, comprising:

• providing a conductive layer on a substrate;
• forming a photoresist layer on a side of the conductive layer away from the substrate;
• exposing the photoresist layer, and then developing the photoresist layer to form a groove extending through the photoresist layer on the photoresist layer, so as to form the photoresist layer with a pattern;
• electrochemically depositing a functional material on the photoresist layer with the pattern, and then removing the photoresist layer to obtain the conductive layer having a pattern layer formed thereon, so as to obtain a gate unit;
• providing an insulating layer on a side of the gate unit away from the substrate;
• providing an active layer and a data line on a side of the insulating layer away from the gate unit;
• and
• providing a source-drain electrode on a side of the active layer away from the insulating layer to obtain the array substrate.