Method for manufacturing source-drain electrode, method for manufacturing array substrate, and display mechanism

A method for manufacturing an array substrate, comprising steps of:

• disposing a gate layer on an underlay;
• disposing an insulating layer on a side of the gate layer away from the underlay;
• disposing an active layer and a data line on a side of the insulating layer away from the underlay;
• disposing a first conductive layer on the active layer;
• forming a first photoresist layer on a side of the first conductive layer away from the underlay;
• exposing and then developing the first photoresist layer to form grooves passing through the first photoresist layer on the first photoresist layer, so as to form a patterned first photoresist layer;
• and
• electrochemically depositing a first functional material on the patterned first photoresist layer and then removing the first photoresist layer to obtain the first conductive layer on which a first patterned layer is formed, so as to form a source-drain electrode, thereby obtaining an array substrate.

A display mechanism, comprising:

• a source-drain electrode having
• a conductive layer disposed on an underlay,
• a photoresist layer disposed on a side of the conductive layer away from the underlay,
• grooves formed through the photoresist layer, thereby forming a patterned photoresist layer, and
• a functional material deposited on the patterned photoresist layer.