Electronic device and method of manufacturing the same
AssigneeSamsung Electronics Co., Ltd.
InventorsJinseong HEO, Yunseong LEE, Sanghyun JO
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AssigneeSamsung Electronics Co., Ltd.
InventorsJinseong HEO, Yunseong LEE, Sanghyun JO
Estimating the term…
Provided are an electronic device and a method of manufacturing the same. The electronic device may include a first device provided on a first region of a substrate; and a second device provided on a second region of the substrate, wherein the first device may include a first domain layer including a ferroelectric domain and a first gate electrode on the first domain layer, and the second device may include a second domain layer including a ferroelectric domain and a second gate electrode on the second domain layer. The first domain layer and the second domain layer may have different characteristics from each other at a polarization change according to an electric field. At the polarization change according to the electric field, the first domain layer may have substantially a non-hysteretic behavior characteristic and the second domain layer may have a hysteretic behavior characteristic.
An electronic device comprising:
A method of manufacturing an electronic device, the method comprising:
The method of claim 18, wherein the first amorphous thin film and the second amorphous thin film comprise an identical base material, and
Dependencies are inferred from the claim text.