Method and apparatus for producing structure, and light irradiation apparatus

A structure manufacturing device, comprising:

• a container that stores a wafer at least whose surface comprises Group III nitride crystal in a state of being immersed in an etching solution containing peroxodisulfate ions;
• and
• a light irradiation device that irradiates the surface of the wafer with light through the etching solution;
• wherein the Group III nitride crystal has a composition in which holes are generated when irradiated with a light having a wavelength of 310 nm or more, and
• the light irradiation device irradiates the surface of the wafer with a first light having a wavelength of 200 nm or more and less than 310 nm under a first irradiation condition, and irradiates a second light having a wavelength of 310 nm or more and a wavelength at which the holes are generated in the Group III nitride crystal, under a second irradiation condition controlled independently of the first irradiation condition.