Shutter Disk
AssigneeApplied Materials, Inc.
InventorsZhang Kang, Junqi Wei, Yueh Sheng Ow, Kelvin Boh, Yuichi Wada, Ananthkrishna Jupudi, Sarath Babu
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Abstract
Describes are shutter disks comprising one or more of titanium (Ti), barium (Ba), or cerium (Ce) for physical vapor deposition (PVD) that allows pasting to minimize outgassing and control defects during etching of a substrate. The shutter disks incorporate getter materials that are highly selective to reactive gas molecules, including O2, CO, CO2, and water.
Claims19
A processing tool comprising:
- a pre-clean chamber having a substrate support therein, the pre-clean chamber including a shutter disk comprising a getter material;
- a buffer station;
- a robot configured to access the pre-clean chamber and the buffer station;
- and
- a controller connected to the pre-clean chamber, the buffer station and the robot, the controller having one or more configurations selected from:
- sputtering the shutter disk to deposit a getter material, etching a substrate with a plasma to remove native oxides and form a cleaned substrate, or depositing a barrier layer.
A non-transitory computer readable medium including instructions, that, when executed by a controller of a processing chamber, causes the processing chamber to perform operations of:
- transferring a shutter disk to a processing chamber, the shutter disk comprising a getter material;
- sputtering the shutter disk to deposit a thickness of the getter material on walls of the processing chamber;
- etching a substrate with a plasma in the processing chamber to remove native oxides and form a cleaned substrate, wherein etching the substrate releases outgassing molecules which are chemically bound to the getter material;
- and
- optionally, removing the shutter disk from the processing chamber.
Dependencies are inferred from the claim text.