Micro-surface morphological matching for reactor components
AssigneeIntel Corporation
InventorsPatrick Whiting, Jeffrey L. Young, Ryan Wood, Eric Scott, David Laube, Alex Collins
Life of this patent
Estimating the term…
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AssigneeIntel Corporation
InventorsPatrick Whiting, Jeffrey L. Young, Ryan Wood, Eric Scott, David Laube, Alex Collins
Estimating the term…
A method is disclosed, which comprises estimating a first value of a parameter of a component, prior to a use of the component in a reactor. In an example, the parameter of the component is to change during the use of the component in the reactor. The component may be treated, subsequent to the use of the component in the reactor. A second value of the parameter of the component may be estimated, subsequent to treating the component. The second value may be compared with the first value, where a reuse of the component in the reactor is to occur in response to the second value being within a threshold range of the first value.
A plasma etch process reactor component comprising a metal, wherein:
A plasma etch process reactor, the reactor comprising:
A plasma etch process reactor showerhead comprising uncoated bulk aluminum, wherein:
Dependencies are inferred from the claim text.