Substrate treating apparatus and substrate treating method

Abstract

A substrate treating apparatus is disclosed. The apparatus includes a process chamber having a treating space defined therein, a support unit for supporting a substrate in the treating space, a gas supply unit for supplying process gas into the treating space, and an RF power source for supplying an RF signal to excite the process gas to a plasma state, wherein the support unit includes an edge ring surrounding the substrate, a coupling ring disposed below the edge ring and including an electrode therein, and an edge impedance control circuit connected to the electrode wherein the edge impedance control circuit includes a harmonics control circuit unit for controlling harmonics caused by the RF power source, and an ion flux control circuit unit for controlling an ion flux in an edge region of the substrate.

Dependencies are inferred from the claim text.