Broadband Plasma Processing Systems and Methods

A method of operating a plasma processing system, comprising:

• generating, by a radio frequency (RF) signal generator, a first signal at a first frequency and a second signal at a second frequency;
• amplifying, by an amplifier circuit, the first signal and the second signal, the amplifier circuit having an output coupled to an electrode of a plasma processing chamber;
• generating, by a sensor of the amplifier circuit, a feedback signal based on a reflection of the first signal and the second signal at the output of the amplifier circuit;
• generating, by a controller, a control signal based on the feedback signal;
• and
• configuring a matching network circuit based on the control signal received from the controller to provide a matching network configuration at the output of the amplifier circuit, the matching network circuit arranged between the RF signal generator and the sensor.

A method of operating a plasma processing system, comprising:

• outputting, by a tunable radio frequency (RF) signal generator, a first signal at a first frequency and a second signal at a second frequency, the second frequency being at least 1.1 times the first frequency;
• supplying, at an output of a broadband power amplifier, first power at the first frequency and second power at the second frequency, the broadband power amplifier coupled to the tunable RF signal generator, the first frequency and the second frequency being within an operating frequency range of the broadband power amplifier, and an output of the broadband power amplifier coupled to an electrode of a plasma processing chamber;
• and
• generating a feedback signal to tune the output of the broadband power amplifier to the first frequency or the second frequency.