Method for monitoring lithographic apparatus
AssigneeASML Netherlands B.V.
InventorsEmil Peter SCHMITT-WEAVER, Kaustuve BHATTACHARYYA, Martin KERS
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Abstract
A method of determining a parameter of a lithographic apparatus, wherein the method includes providing first height variation data of a first substrate, providing first performance data of a first substrate, and determining a model based on the first height variation data and the first performance data. The method further includes obtaining second height variation data of a second substrate, inputting the second height variation data to the model, and determining second performance data of the second substrate by running the model. Based on the second performance data, the method determines a parameter of the apparatus.
Claims20
A method comprising:
- decomposing first height variation data of a first substrate, into at least a substrate specific fingerprint;
- determining a model based at least partially on the first height variation data, first performance data of the first substrate and the substrate specific fingerprint;
- obtaining second height variation data of a second substrate;
- inputting the second height variation data to the model;
- determining, by running the model using a hardware computer system, second performance data of the second substrate;
- and
- determining a parameter of a lithographic apparatus based on the second performance data.
A method comprising:
- obtaining a model trained to correlate height variation data to performance parameter data;
- obtaining a set of height variation data of a substrate;
- decomposing the set of height variation data to determine a process signature of the substrate;
- inputting data related to the process signature to the model;
- running the model, using a hardware computer system, to determine a predicted deviation of the performance parameter between the substrate and a substrate standard;
- and
- calibrating the substrate using the predicted deviation of the performance parameter.
Dependencies are inferred from the claim text.